Reflectometry-Based Technique for Characterising Complex Thin-Film Structures (Aalto U. et al.)
Technical Paper Link
A new technical paper, “Characterisation of Complex Multilayer Nanostructures with High Aspect Ratio,” was recent published by researchers at Aalto University, University of Eastern Finland, Chipmetrics OY, and VTT MIKES. Abstract “Deposition studies of deep vertical dips on semiconductor wafers can create problems at an industrial manufacturing scale, since cross-sectioning requires a lot of time... » read more The post Reflectometry-Based Technique for Characterising Complex Thin-Film Structur