A research team led by Senior Researcher Hyeong-U Kim of the Semiconductor Manufacturing Research Center at the Korea Institute of Machinery and Materials (President Seok-Hyeon Ryu, hereinafter referred to as KIMM) developed synthesis and etching processes for 6-inch next-generation 2D semiconductors (MoS₂ and WS₂) using low-temperature plasma-based PECVD and RIE equipment and implemented them into an AI-based intelligent system.