A Transformer-based Sequence Prediction Architecture for Etch Profile Evolution in Semiconductor Manufacturing

The precise control of three-dimensional feature profiles during plasma etching is a fundamental challenge in nanoscale device fabrication, directly impacting performance and yield. While conventional physics-based simulations can capture the underlying plasma-surface interactions, their prohibitive computational cost limits their use for large-area analysis or rapid process development. To bridge this gap, we introduce EtchFormer, a Transformer-based deep learning framework engineered as a high