Artificial intelligence (AI) and machine learning (ML) demonstrate transformative potential in optimizing complex semiconductor manufacturing. This study addresses two critical areas: process control for 3D NAND fabrication and predictive maintenance (PdM) of fab equipment. For optimizing Thin Film deposition and Chemical Mechanical Planarization (CMP) processes, Artificial Neural Networks (ANNs) capture complex, non-linear dynamics, achieving prediction accuracies up to ~91.4% for controlling s