Ultrapure water (UPW) is indispensable in semiconductor manufacturing, where it serves as the foundational input for wafer cleaning, chemical dilution, and rinsing steps. As device geometries shrink below 5 nm, even parts-per-trillion (ppt) levels of contaminants can compromise yield, reliability, and compliance with industry standards such as SEMI F63 and ASTM D5127. Emerging contaminants (ECs) including per- and polyfluoroalkyl substances (PFAS), pharmaceuticals and personal care products (PPC