TThe International Journal of Advanced Manufacturing Technology16d agoNovel hemispherical Halbach array configuration and material removal mechanisms for magnetorheological polishing of polymethyl methacrylateQuach Vu Hieu·Nguyễn Duy Trình·Le Thi Phuong Thanh·Nguyen Chi Tam·Dao Ngoc Hoanh·Le Dang Ha·Nguyen Minh Quang·Nguyen Tien TungRead at The International Journal of Advanced Manufacturing TechnologyTagsAdvanced Surface Polishing TechniquesBiomedical Engineering
