The effect of contact-line motion on the deposition of particles from an evaporating sessile droplet

A mathematical model for the deposition of particles from a thin sessile droplet undergoing diffusion-limited evaporation in four different modes of evaporation, namely the constant contact radius (CR), constant contact angle (CA), stick–slide (SS), and stick–jump (SJ) modes, is formulated and analysed. Explicit expressions are obtained for the flow and concentration of particles within the droplet, as well as the evolutions of the mass of particles in the bulk of the droplet and in a distribute