Optimization and stabilization of a compact laser-plasma EUV source based on pulsed Xe/He double-stream gas jets

We present our progress of a compact laser-plasma extreme ultraviolet (EUV) source based on Xe/He double-stream gas jets irradiated by a 700-mJ Nd:YAG laser. The source was characterized using a flat-field spectrometer, an absolutely calibrated EUV energy meter, and a pinhole camera imaging system. A Maximum single-pulse EUV intensity of 2.36 mJ was achieved at 13.5 nm (2% bandwidth, 2π sr), corresponding to a conversion efficiency of 0.34%. Meanwhile, the plasma size was reduced to a length of